Wang, Lei#, Asempah, Isaac, Dong, Song-Tao, Yin, Pian-Pian, Jin, Lei#. Quantitative studies of electric field intensity on atom diffusion of Cu/Ta/Si stacks during annealing. Applied Surface Science, 2017 399, 215-219

发布者：汪蕾发布时间：2022-05-24浏览次数：173

Wang, Lei#, Asempah, Isaac, Dong, Song-Tao, Yin, Pian-Pian, Jin, Lei#. Quantitative studies of electric field intensity on atom diffusion of Cu/Ta/Si stacks during annealing. Applied Surface Science, 2017 399, 215-219


(0) (0)