Wang, Lei#, Jin Lei, Yu Li Hua, Dong Song Tao, Chen Jian, Xu Jun Hua#. Evaluation of electric field intensity on atom diffusion of Cu/Ta/Si stacks during annealing. Applied Physics A, 2015 122(1)

发布者：汪蕾发布时间：2022-05-24浏览次数：106

Wang, Lei#, Jin Lei, Yu Li Hua, Dong Song Tao, Chen Jian, Xu Jun Hua#. Evaluation of electric field intensity on atom diffusion of Cu/Ta/Si stacks during annealing. Applied Physics A, 2015 122(1)


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