Wang, Lei#, Xu Jun Hua, Yu Li Hua, Effect of electric field intensity on atom diffusion in Cu/Ta/Si stacks. In: TMS2015 Supplemental Proceedings, The Minerals, Metals & Materials Society, Wiley, Hoboken, Orlando, USA, 2015, 575

发布者：汪蕾发布时间：2022-05-24浏览次数：128

Wang, Lei#, Xu Jun Hua, Yu Li Hua, Effect of electric field intensity on atom diffusion in Cu/Ta/Si stacks. In: TMS2015 Supplemental Proceedings, The Minerals, Metals & Materials Society, Wiley, Hoboken, Orlando, USA,  2015, 575


(0) (0)