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测试频率对钕掺杂钛酸铋铁电薄膜极化反转疲劳特性的影响。
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TiO2过渡层对Bi3.54Nd0.46Ti3O12薄膜微观结构及电性能的影响。
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Microstructure control of (Pb,Sr)TiO3 films on Pt/Ti/SiO2/Si substrates by a TiO2.
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Dielectric properties and I-V characteristics of (Pb0.4Sr0.6)TiO3 Thin films improved by TiO2 buffer layers.
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